Program
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Mark Pinto |
E2-180 - Simularium
Click here for the 2009 Research Review Day Program
Keynote Speaker:
Mark Pinto
Chief Technology Officer and Senior Vice President
General Manager, Energy and Environmental Solutions
Applied Materials, Inc.
Nanomanufacturing Technology for Energy Applications
Over 40 years of thin film process innovations have helped enable the IC industry today to produce well over 1018 transistors per year at costs of nanodollars per transistor thereby empowering the information age. Likewise large area thin film manufacturing has dramatically improved the performance and cost of low cost displays over the past 15 years, enabling high definition video from the handheld to the wall mounted HDTV. The overwhelming societal and market pull today for new solutions in the field of clean energy offers an exciting opportunity to build on a similar base of technology. Through a combination of materials innovation and highly productive processing platforms we have the potential to enable new solutions for conservation, conversion and storage and thus profoundly change the economics of clean energy.
NEW LUNCH SPEAKER SESSION ADDED
12:40-1:00 PM
E2-599
Garth V. Hobson
Director, Turbopropulsion Laboratory
Department of Mechanical and Astronautical Engineering
Naval Postgraduate School
Abstract
A new concept of embedding a cross-flow fan (CFF) into a thick wing for thrust production is proposed. Measurements performed, with NASA sponsorship, have indicated that to lift a 1,000 lb air vehicle will require a six-inch diameter CFF that is fifteen feet long, spinning at 6,000 rpm. The power consumption would be of the order of 500 HP. The CFF would be divided into three sections for a tripod lift system that would be thrust vectored for vertical and horizontal flight. This would reduce the overall width of the vehicle to around 12 feet. Conventional take-off and landing vehicles would require shorter CFF lengths.
Testing of various CFF configurations at the Turbopropulsion Laboratory (TPL) has determined the performance map of this unsteady flow device. Pressure ratios as high as 1.2 have been achieved as well as efficiencies in excess of 70%. Two-dimensional, unsteady, numerical modeling of the floe through the CFF has been successfully accomplished with ANSYS CFX code. These calculations accurately predicted the performance of the CFF even up to stall conditions.



